LIGO Document G1501068-v2

Room temperature mechanical loss of high stress silicon nitride film measured by cantilever ring-down method on double-side coated cantilever

Document #:
LIGO-G1501068-v2
Document type:
G - Presentations (eg Graphics)
Other Versions:
Abstract:
We report results of the loss angle measurement for high stress PECVD silicon nitride films.
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Topics:
Keywords:
silicon nitride
Referenced by:
Associated with Events:
held from 26 Aug 2015 to 03 Sep 2015 in Budapest, Hungary

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